/ 2026 / Advertising / Product

Resistance

Featuring the collection of the designer Emily P. Wheeler, entitled Resistance, draws inspiration from the concept and ideals associated with Resistance, as well as Tie-Dye techniques. The Photo and styling team, Nicholas Duers and Michele Faro, were tasked with the challenge of creating a modern, tasteful, and complimentary interpretation of tie dye, to echo the spirit and design of the collection.

Nicholas Duers currently operates out of his photography studio located in Midtown, NYC. A graduate of the Rochester Institute of Technology, he specializes in still-life photography of luxury goods, fashion accessories, and beauty products.

Awards www.nicholasduers.com

Px3 logo
Privacy Overview

This website uses cookies so that we can provide you with the best user experience possible. Cookie information is stored in your browser and performs functions such as recognising you when you return to our website and helping our team to understand which sections of the website you find most interesting and useful.